CHEN Yong-qiu, LIU Yu-lan, WANG Biao. Minimum Size of 180 Degree Domains in Ferroelectric Thin Films Covered by Electrodes[J]. Applied Mathematics and Mechanics, 2006, 27(8): 899-903.
Citation: CHEN Yong-qiu, LIU Yu-lan, WANG Biao. Minimum Size of 180 Degree Domains in Ferroelectric Thin Films Covered by Electrodes[J]. Applied Mathematics and Mechanics, 2006, 27(8): 899-903.

Minimum Size of 180 Degree Domains in Ferroelectric Thin Films Covered by Electrodes

  • Received Date: 2005-06-07
  • Rev Recd Date: 2006-04-30
  • Publish Date: 2006-08-15
  • Ferroelectric domain switching under low voltage or short pulses is of interest to the development of high-density random access memory(FRAM)devices.Being necessarily very small in size,instability and back switching often occurs when the external voltage is removed,and creates serious problems.A general approach to determine the minimum size of ferroelectric domain to avoid back switching was developed,and as an example,a 180 degree domain in a ferroelectric thin film covered by the upper and lower electrodes was considered in detail.The results show that the approach is generally applicable to many other fields,including phase transformation,nucleation and expansion of dislocation loops in thin films,etc.
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  • [1]
    Scott J,Avaujo C,Paz De.Ferroelectric memories[J].Science,1989,246(4936):1400—1405. doi: 10.1126/science.246.4936.1400
    [2]
    Song Y J,Koo B J,Lee J K,et al.Electrical properties of highly reliable plug buffer layer for high-density ferroelectric memory[J].Appl Phys Lett,2002,80(13):2377—2379. doi: 10.1063/1.1467619
    [3]
    Luthi R, Haefke H, Meyer K-P,et al.Surface and domain structures of ferroelectric GASH crystals studied by scanning force microscopy[J].Surf Sci,1993,285(1/2):L498—L502.
    [4]
    Paruth P, Tybell T,Triscone J-M.Nanoscale control of ferroelectric polarization and domain size in epitaxial Pb(Zr0.2Ti0.8)O3 thin films[J].Appl Phys Lett,2001,79(4):530—532. doi: 10.1063/1.1388024
    [5]
    Li X, Mamchik A, Chen I-W.Stability of electrodeless ferroelectric domains near a ferroelectric/dielectric interface[J].Appl Phys Lett,2001,79(6):809—811. doi: 10.1063/1.1390326
    [6]
    Gopalan V, Mitchell T E. Wall velocities, switching times, and the stabilization mechanism of 180° domains in congruent LiTaO3 crystals[J].J Appl Phys,1998,83(2):941—954. doi: 10.1063/1.366782
    [7]
    Wang B, Woo C H.Stability of 180° domain in ferroelectric thin films[J].J Appl Phys,2003,94(1):610—617. doi: 10.1063/1.1578529
    [8]
    Landauer R. Electrostatic considerations in BaTiO3 domain formation during polarization reversal[J].J Appl Phys,1957,28(2):227—234. doi: 10.1063/1.1722712
    [9]
    Wang B, Xiao Z.On the dynamic growth of a 180° domain in a ferroelectric material[J].J Appl Phys,2000,88(3):1464—1472. doi: 10.1063/1.373840
    [10]
    Loge R E,Suo Z. Nonequilibrium thermodynamics of ferroelectric domain evolution[J].Acta Mater,1996,44(8):3429—3438. doi: 10.1016/1359-6454(95)00425-4
    [11]
    Wang B, Woo C H.Atomic force microscopy-induced electric field in ferroelectric thin films[J].J Appl Phys,2003,94(6):4053—4059. doi: 10.1063/1.1603345
    [12]
    Gruyitch L, Richard J-P, Borne P,et al.Stability Domain[M].New York:Chapman & Hall/CRC,2004, 137.
    [13]
    Woo J, Hong S, Setter N,et al.Quantitative analysis of the bit size dependence on the pulse width and pulse voltage in ferroelectric memory devices using atomic force microscopy[J].J Vac Sci Technol, B,2001,19(3):814—824.
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